{"id":41,"date":"2015-01-23T07:22:47","date_gmt":"2015-01-23T07:22:47","guid":{"rendered":"https:\/\/www.watanabe-lab.jp\/en\/?page_id=41"},"modified":"2019-02-25T14:15:38","modified_gmt":"2019-02-25T14:15:38","slug":"presentations","status":"publish","type":"page","link":"https:\/\/www.watanabe-lab.jp\/en\/presentations.html","title":{"rendered":"Presentations"},"content":{"rendered":"<ol>\n<li>(Invited, plenary) Takanobu Watanabe, Motohiro Tomita, Tianzhuo Zhan, Hui Zhang, Takashi Matsukawa, Takeo Matsuki, Yoshinari Kamakuri, and Hiroya Ikeda, \u201cCMOS Friendly Silicon-based Micro Thermoelectric Generator,\u201d<strong>\u00a05th International Conference on Nanoscience and Nanotechnology (ICONN2019)<\/strong>,\u00a0 SRM Institute of Science and Technology, Kattankulathur,\u00a0\u00a0Chennai, India, January 30, 2019.<\/li>\n<li>Gakuki Ise,\u00a0\u00a0Daiki Yoda, Chinami Takiguchi, Naoya Shigematsu, Tomohiro Shiratori, Hisami Nakano, Woojae Jeon, Taichi Nozawa, Kei Iwashiro, Takumi Nishino, Toshitatsu Munakata and Takanobu Watanabe, \u201cControlling The Aerial Posture of a Flapping-wing Micro Air Vehicle by Shifting Its Center of Gravity,\u201d\u00a0<strong>The International Micro Air Vehicle Conference and Competition (IMAV)<\/strong>, RMIT Melbourne, November, 23 (2018).<\/li>\n<li>Mao Xu,\u00a0Tianzhuo Zhan, Ryo Yamato, Hiroki Takezawa, Kohei Mesaki, Motohiro Tomita, Yibin Xu, and Takanobu Watanabe \u201cMetal\/Insulator Multilayered Thermally Conductive Films,\u201d\u00a0<strong>31st International Microprocesses and Nanotechnology Conference (MNC 2018)<\/strong>,\u00a0 Sapporo Park Hotel, Sapporo, Japan, November, 16 (2018).<\/li>\n<li>Rina Sankawa, Takuya Onishi, Kohei Takahashi, Motohiro Tomita, Takahiro Nakamura, Kotaro Mura, Tetsuo Yoshimitsu, and Takanobu Watanabe, \u201cNanometer-Scale Observation of Dielectric Breakdown Path in Insulating Epoxy Resin by Using Micro-Gap Electrode Device,\u201d\u00a0<strong>31st International Microprocesses and Nanotechnology Conference (MNC 2018)<\/strong>, Sapporo Park Hotel, Sapporo, November, 15 (2018)<\/li>\n<li>Shota Kanemaru, Okuto Takahashi, Marc C. Perea, Motohiro Tomita, Takanobu Watanabe, \u201cComputational Experiment on the Dipole Layer Formation at Oxide Hetero-interface,\u201d\u00a0<strong>14th International Conference on Atomically Controlled Surfaces, Interfaces and Nanostructures (ACSIN-14)<\/strong>,\u00a0Sendai International Center, Sendai, Japan, October, 22 (2018).<\/li>\n<li>Keisuke Shima,\u00a0Motohiro Tomita, Hui Zhang,\u00a0Tianzhuo Zhan,\u00a0Takashi Matsukawa, Takeo Matsuki, and Takanobu Watanabe, \u201cOptimum substrate design of planar type Si nanowire thermoelectric generator\u201d\u00a0<strong>2018 International Conference on Solid State Devices and Materials (SSDM2018)<\/strong>, The University of Tokyo, Tokyo, September 13, (2018).<\/li>\n<li>Motohiro Tomita, Takehiro Kumada, Keisuke Shima, Tianzhuo Zhan, Hui Zhang, Takashi Matsukawa, Takeo Matsuki, and Takanobu Watanabe, \u201cSubstrate Heat Resistance Engineering for Realizing High Performance Si Nanowires Thermoelectric Generator,\u201d\u00a0<strong>2018 International Conference on Solid State Devices and Materials (SSDM2018)<\/strong>, The University of Tokyo, Tokyo, September 13, (2018).<\/li>\n<li>Marc Perea, Okuto Takahashi, Shota Kanemaru, Motohiro Tomita, Takanobu Watanabe, \u201cConsidering possible descriptors for Dipole Moment at High-k\/SiO<sub>2<\/sub>\u00a0interfaces\u201d\u00a0<strong>2018 International Conference on Solid State Devices and Materials (SSDM2018)<\/strong>,\u00a0The University of Tokyo, Tokyo, September 13, (2018).<\/li>\n<li>Tianzhuo Zhan, Mao Xu, Ryo Yamato, Motohiro Tomita, Seong-Woo Kim, Koji Koyama, Takanobu Watanabe ,\u201d Large size freestanding diamond substrate with high thermal conductivity fabricated by a two-step micropattern heteroepitaxial growth method \u201d\u00a0<strong>The 29th International Conference on Diamond and Carbon Materials<\/strong>, Dubrovnik, Croatia,\u00a0September 5 , (2018).<\/li>\n<li><span style=\"text-decoration: underline;\">Motohiro Tomita<\/span>, Shunsuke Ohba,\u00a0Yuya Himeda,\u00a0Ryo Yamato,\u00a0Keisuke Shima,\u00a0Takehiro Kumada,\u00a0Mao Xu,\u00a0Hiroki Takezawa,\u00a0Kohei Mesaki,\u00a0Kazuaki Tsuda,\u00a0Shuichiro Hashimoto, Tianzhuo Zhan,\u00a0Hui Zhang,\u00a0Yoshinari Kamakuri,\u00a0Yuhei Suzuki,\u00a0Hiroshi Inokawa,\u00a0Hiroya Ikeda,\u00a0Takashi Matsukawa,\u00a0Takeo Matsuki, Takanobu Watanabe, &#8220;10\u03bcW\/cm<sup>2<\/sup>-Class High Power Density Silicon Thermoelectric Energy Harvester Compatible with CMOS-VLSI Technology,&#8221; <strong>2018 Symposium on VLSI Technology<\/strong>,\u00a0 Hilton Hawaiian Village, Honolulu, June 20, (2018).<\/li>\n<li><span style=\"text-decoration: underline;\">Shuichiro Hashimoto<\/span>, Kouta Takahashi, Shunsuke Oba, Takuya Terada, Masataka Ogasawara, Motohiro Tomita, Masashi Kurosawa, and Takanobu Watanabe, &#8220;Thermoelectric Characteristics of Rapid-Melting-Grown SiGe Wires Measured by Peltier Cooling Experiment,\u201c <strong>2nd Electron Devices Technology and Manufacturing (EDTM) Conference 2018<\/strong>, Ariston Hotel Kobe, Kobe, Japan, Mar. 13-15 (2018).<\/li>\n<li><span style=\"text-decoration: underline;\">Tianzhuo Zhan<\/span>, Ryo Yamato, Shuichiro Hashimoto, Shunsuke. Oba, Yuya Himeda, Yibin Xu, Takashi Matsukawa, and Takanobu Watanabe, &#8220;Enhanceent of Thermoelectric Power of Silicon Nanowire Micro Thermoelectric Generator by Improving the Thermal Conductivity of AlN Thermal Conductive Film,&#8221; <strong>The 17th International Conference on Micro and Nanotechnology for Power Generation and Energy Conversion Applications (Power MEMS 2017)<\/strong>, Kanazawa Bunka Hall, Kanazawa, Japan, November 14 &#8211; 17, 2017.<\/li>\n<li><span style=\"text-decoration: underline;\">Koki Nakane<\/span>, Motohiro Tomita, Takanobu Watanabe, &#8220;Machine Learning of Interfacial Dipole Moments Between Multicomponent Oxide Films by Neural Network Model,&#8221; <strong>2017 International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES: SCIENCE AND TECHNOLOGY(IWDTF 2017)<\/strong>, Todaiji Temple Cultural Center, Nara, Japan, November 20, 2017<\/li>\n<li><span style=\"text-decoration: underline;\">Nobuhiro Nakagawa<\/span>, Okuto Takahashi, Takanobu Watanabe, &#8220;Computational Experiment on Dipole Formation at High-k\/SiO2 Interface Using Virtual Oxide Models,&#8221; <strong>2017 International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES: SCIENCE AND TECHNOLOGY(IWDTF 2017)<\/strong>, Todaiji Temple Cultural Center, Nara, Japan, November 20, 2017<\/li>\n<li><span style=\"text-decoration: underline;\">Okuto Takahashi<\/span>, Nobuhiro Nakagawa, Motohiro Tomita, Takanobu Watanabe ,&#8221;Investigation of Dipole Formation at AlOxNy\/SiO2 interface by MD simulation,&#8221; <strong>2017 International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES: SCIENCE AND TECHNOLOGY(IWDTF 2017)<\/strong>, Todaiji Temple Cultural Center, Nara, Japan, November 20, 2017<\/li>\n<li>(invited)<span style=\"text-decoration: underline;\">Takanobu Watanabe<\/span>, \u201cMolecular Dynamics of Dipole Layer Formation at High-k\/SiO<sub>2<\/sub>\u00a0Interface,\u201d\u00a0<strong>232nd ECS MEETING<\/strong>, National Harbor, Washington, DC, USA.\u00a0Oct. 4, 2017.<\/li>\n<li><span style=\"text-decoration: underline;\">Yuya Himeda<\/span>, Shuichiro Hashimoto, Shunsuke Oba, Ryo Yamato, Takashi Matsukawa , Takanobu Watanabe, \u201cEnhancement of Thermoelectric perfomance of p-type Short Silicon Nanowires,\u201d 2017 International Conference on Solid State Devices and Materials, Sendai International Center, Sendai, Japan, September 22, 2017.<\/li>\n<li><span style=\"text-decoration: underline;\">Keisuke Shima<\/span>, Motohiro Tomita, Yoshinari Kamakura, Takanobu Watanabe, \u201cPossibility of Thermoelectric Property Improvement by Non-uniformly Doped Si,\u201d 2017 International Conference on Solid State Devices and Materials (SSDM2017),\u00a0Sendai International Center, Sendai, Japan, September\u00a021, 2017.<\/li>\n<li><span style=\"text-decoration: underline;\">Ryo Yamato<\/span>, Shuichiro Hashimoto, Tianzhuo Zhan, Shunsuke Oba, Yuya Himeda, Takashi Matsukawa, Takanobu Watanabe, \u201cImpact of Crystallinity of AlN Thermal Conductive Film on Thermoelectric Power of Silicon Nanowire Micro Thermoelectric Generator, \u201d 2017 International Conference on Solid State Devices and Materials(SSDM2017),\u00a0Sendai International Center, Sendai, Japan, September\u00a021, 2017.<\/li>\n<li><span style=\"text-decoration: underline;\">Motohiro Tomita<\/span>, Takanobu Watanabe, \u201cDevelopment of Interatomic Potential of Ge(1-x-y)SixSny Ternary Alloy Semiconductors for Classical Lattice Dynamics Simulation,\u201d 2017 International Conference on\u00a0 Solid State Devices and Materials (SSDM 2017),\u00a0 Sendai International Center, Sendai, Japan, September 19-22, 2017.<\/li>\n<li>(invited)<span style=\"text-decoration: underline;\">Takanobu Watanabe<\/span>, \u201cFormation Mechanisms of Gate Oxide Films,\u201d 2017 International Conference on \u00a0Solid State Devices and Materials (SSDM 2017), Short\u00a0Course, Sendai International Center, Sendai, September\u00a019, 2017.<\/li>\n<li><span style=\"text-decoration: underline;\">Takuya Onishi<\/span>, Genki Obana, Shuichiro Hashimoto, Motohiro Tomita, Takanobu Watanabe,\u00a0Kotaro Mura, Toshihiro Tsuda, Tetsuo Yoshimitsu, &#8220;Nano-scale Evaluation of Electrical Tree Initiation in Silica\/Epoxy Nano-Composite Thin Film,&#8221; 8th International Symposium on Electrical Insulating Materials, Toyohashi Chamber of Commerce &amp; Industry, Toyohashi, September 12-15, 2017.<\/li>\n<li>(invited)Takanobu Watanabe, \u201cSilicon-based Micro Thermoelectric Generator Fabricated by CMOS Compatible Process,\u201d The 2017 International Meeting for Future of Electron Devices, Kansai (IMFEDK2017), Kyoto, \u00a0June 29-30, 2017<\/li>\n<li><span style=\"text-decoration: underline;\">Takanobu Watanabe<\/span>, Shuhei Asada, Taiyu Xu, Shuichiro Hashimoto, Shunsuke Ohba, Yuya Himeda, Ryo Yamato, Hui Zhang, Motohiro Tomita, Takashi Matsukawa, Yoshinari Kamakura and Hiroya Ikeda, &#8220;A Scalable Si-based Micro Thermoelectric Generator,&#8221; Electron Devices Technology and Manufacturing Conference (EDTM2017), Toyama, Feb.28th &#8211; Mar. 2nd, 2017<\/li>\n<li><span style=\"text-decoration: underline;\">Motohiro Tomita<\/span>, Atsushi Ogura, and Takanobu Watanabe, &#8220;Development and Verification of Interatomic Potential of Group IV Binary Alloy Semiconductors for Lattice Dynamics Simulation,&#8221; the 7th International Symposium on Advanced Science and Technology of Silicon Materials, Kona, Hawaii, November 24, 2016.<\/li>\n<\/ol>\n<p><!--nextpage--><\/p>\n<ol>\n<li><u>Ryota Kunugi<\/u>, Nobuhiro Nakagawa, Takanobu Watanabe, &#8220;Molecular Dynamics study on Dipole Layer Formation at High-k\/SiO<sub>2<\/sub> Interface: -Possibility of Oxygen Ion Migration Induced by the Imbalance of Multipole Potentials-&#8221;\u00a0the 29th International Microprocesses and Nanotechnology\u00a0Conference (MNC 2016), Kyoto, November \u00a011, 2016.<\/li>\n<li><span style=\"text-decoration: underline;\">Shuhei Asada<\/span>, Shuichiro Hashimoto, X. Zhang , Taiyu Xu, Shunsuke Oba , Ryo Yokogawa, Motohiro Tomita, Atsushi Ogura, Takashi Matsukawa \u00a0and Takanobu Watanabe, &#8220;Impact of Ar+ Ion Irradiation on Nickelidaton Reaction of Si Nanowire Covered with Oxide Film,&#8221;\u00a0\u00a0the 29th International Microprocesses and Nanotechnology\u00a0Conference (MNC 2016), Kyoto, November \u00a011, 2016.<\/li>\n<li><span style=\"text-decoration: underline;\">Shuichiro Hashimoto<\/span>, Shuhei Asada, Taiyu Xu, Shunsuke Oba, Takashi Matsukawa, Takanobu Watanabe, &#8220;Dopant Distribution in Nickelided Si Nanowire Surrounded by SiO<sub>2<\/sub> Film Characterized by Laser-assisted Atom Probe Tomography,&#8221;\u00a0the 29th International Microprocesses and Nanotechnology\u00a0Conference (MNC 2016), Kyoto, November \u00a010, 2016.<\/li>\n<li>(Invited) <span style=\"text-decoration: underline;\">Takanobu Watanabe<\/span>, &#8220;Atomistic Origin of Dipole Layer at High-k\/SiO<sub>2<\/sub> Interface,&#8221; 13th International Conference on\u00a0Atomically Controlled Surfaces, Interfaces and Nanostructures (ACSIN-13), Rome,\u00a0Italy, October 10, 2016.<\/li>\n<li><span style=\"text-decoration: underline;\">Motohiro Tomita<\/span>, Atsushi Ogura, Takanobu Watanabe, &#8220;Development of Interatomic Potential of Group IV Alloy Semiconductors for Lattice Dynamics Simulation,&#8221; G05: SiGe, Ge, and Related Materials: Materials, Processing, and Devices 7, ECS\/PRiME 2016, Honolulu, Hawaii, October 4, 2016.<\/li>\n<li><span style=\"text-decoration: underline;\">Shuichiro Hashimoto<\/span>, Shuhei Asada, Taiyu Xu, Shunsuke Oba, Takashi Matsukawa, Takanobu Watanabe, &#8220;Anomalous Thermoelectric Characteristic of Silicon Nanowire Between Heavily Doped Silicon Pads,&#8221; 2016 International Conference on \u00a0Solid State Devices and Materials (SSDM 2016),\u00a0 Tsukuba, Japan, September 29, 2016.<\/li>\n<li>(Invited) <span style=\"text-decoration: underline;\">Takanobu Watanabe<\/span>, &#8220;Molecular Dynamics Simulations on the Formation of Dielectric Thin Films and Interface Properties,&#8221; 2016 International Conference on \u00a0Solid State Devices and Materials (SSDM 2016), Short\u00a0Course A\u00a0&#8220;Fundamental Physics for Modeling and Simulations toward Future Electronic Device&#8221;, Tsukuba, Japan, September 26, 2016.<\/li>\n<li><span style=\"text-decoration: underline;\">Shuichiro Hashimoto<\/span>, Shuhei Asada, Taiyu Xu, Shunsuke Oba, Takashi Matsukawa, and Takanobu Watanabe, &#8220;A Silicon Nanowire Thermoelectric Device Fabricated by Top-Down Process,&#8221; the European Conference on Thermoelectrics 2016 (ECT2016), Lisbon, Portugal, \u00a0September 20th-23, 2016.<\/li>\n<li><span style=\"text-decoration: underline;\">Taiyu Xu<\/span>, Shuichiro Hashimoto, Shuhei Asada, and Takanobu Watanabe, &#8220;Designing of a short leg thermoelectric generator on silicon,&#8221; the European Conference on Thermoelectrics 2016 (ECT2016), Lisbon, Portugal, \u00a0September 20th-23, 2016.<\/li>\n<li>(Invited) <span style=\"text-decoration: underline;\">Takanobu Watanabe<\/span>, &#8220;Statistical Simulation of Noise and Fluctuations in Nano-scale Silicon Transistors,&#8221; BIT&#8217;s 5th Annual World Congress of Advanced Materials-2016 (WCAM-2016), Chongqing, China, June 8, 2016.<\/li>\n<\/ol>\n<p><!--nextpage--><\/p>\n<ol>\n<li><span style=\"text-decoration: underline;\">Shuichiro Hashimoto<\/span>, Kohei Takei, Jing Sun, Shuhei Asada, Xu Zhang, Taiyu Xu, Toshihiro Usuda, Motohiro Tomita, Ryosuke Imai, Atsushi Ogura, Takashi Matsukawa, Meishoku Masahara,\u00a0and Takanobu Watanabe, &#8220;Origin of Preferential Diffusion of Ni along Si\/SiO<sub>2<\/sub> Interface in Si Nanowire,&#8221; 28th\u00a0International Microprocesses and Nanotechnology Conference (MNC 2015), Toyama International Conference Center, Toyama, Nov. 12, 2015.<\/li>\n<li><span style=\"text-decoration: underline;\">Shuhei Asada<\/span>, Shuichiro Hashimoto, Kohei Takei, Jing Sun, Xu Zhang, Taiyu Xu, Toshihiro Usuda, Motohiro Tomita, Ryosuke Imai, Atsushi Ogura, Takashi Matsukawa, Meishoku Masahara,\u00a0and Takanobu Watanabe, &#8220;Controlling Nickelidation Process of Si Nanowire by Ar+ Ion Irradiation,&#8221; 28th\u00a0International Microprocesses and Nanotechnology Conference (MNC 2015), Toyama International Conference Center, Toyama, Nov. 11, 2015.<\/li>\n<li><span style=\"text-decoration: underline;\">Shuichiro Hashimoto<\/span>, and Takanobu Watanabe, &#8220;A New Reactive Force Field for Study on the Formation of SiC\/SiO<sub>2<\/sub> Interface,&#8221; 2015 International Workshop on Dielectric Thin Films For Future Electron Devices: Science and Technology (IWDTF 2015), Miraikan, National Museum of Emerging Science and Innovation, Tokyo, Nov. 4, 2015.<\/li>\n<li><span style=\"text-decoration: underline;\">Ryota Kunugi<\/span>, Kosuke Shimura, Takanobu Watanabe, &#8220;Molecular Dynamics Study on Dipole Layer Formation at Mg<sub>x<\/sub>Al<sub>y<\/sub>O<sub>x+1.5y<\/sub>\/SiO<sub>2<\/sub> Interfaces,&#8221; 2015 International Workshop on Dielectric Thin Films For Future Electron Devices: Science and Technology (IWDTF 2015), Miraikan, National Museum of Emerging Science and Innovation, Tokyo, Nov. 2, 2015.<\/li>\n<li><span style=\"text-decoration: underline;\">Kosuke Shimura<\/span>, R<span style=\"line-height: 1.5;\">yota Kunugi<\/span><span style=\"line-height: 1.5;\">, Atsushi Ogura<\/span><span style=\"line-height: 1.5;\">, Shinichi Satoh<\/span><span style=\"line-height: 1.5;\">, Jiayang Fei<\/span><span style=\"line-height: 1.5;\">, Koji Kita<\/span><span style=\"line-height: 1.5;\">,\u00a0<\/span>and Takanobu Watanabe, &#8220;Positive and Negative Dipole Layer Formation at High-k\/SiO<sub>2\u00a0<\/sub>Interfaces Simulated by Classical Molecular Dynamics,&#8221; 2015 International Conference on Solid State Devices and Materials (SSDM 2015), Sapporo Convention Center, Sapporo, Sep. 29, 2015.<\/li>\n<li><span style=\"text-decoration: underline;\">Kohei Takei<\/span>,\u00a0<span style=\"line-height: 1.5;\">Shuichiro Hashimoto<\/span><span style=\"line-height: 1.5;\">, Jing Sun<\/span><span style=\"line-height: 1.5;\">, Xu Zhang<\/span><span style=\"line-height: 1.5;\">, Shuhei Asada<\/span><span style=\"line-height: 1.5;\">, Taiyu Xu<\/span><span style=\"line-height: 1.5;\">,\u00a0<\/span>Takashi Wakamizu, Takashi Matsukawa, Meishoku Masahara\u00a0and Takanobu Watanabe, &#8220;ON Current Enhancement of Nanowire Schottky Barrier Tunnel FET,&#8221; 2015 International Conference on Solid State Devices and Materials (SSDM 2015), Sapporo Convention Center, Sapporo, Sep. 29, 2015.<\/li>\n<li><span style=\"text-decoration: underline;\">Shuichiro Hashimoto<\/span>, Kohei Takei, Jing Sun, Shuhei Asada, Taiyu Xu\u00a0and Takanobu Watanabe, &#8220;Enhancement of Ni Diffusion Rate in Disordered Si Nanocrystal\u00a0Studied by Molecular Dynamics Simulation,&#8221;\u00a0The 6th\u00a0Waseda-NIMS International Symposium, Waseda University, Jul. 29, 2015.<\/li>\n<li><span style=\"text-decoration: underline;\">Kohei Takei<\/span>, Shuichiro Hashimoto, Jing Sun, Shuhei Asada, Xu Zhang, Taiyu Xu,\u00a0Toshihiro Usuda, Motohiro Tomita, Ryosuke Imai, Atsushi Ogura,\u00a0Takashi Matsukawa, Meishoku Masahara\u00a0and Takanobu Watanabe, &#8220;Controlling Nickel Silicidation Process of Si Nanowires by Ar<sup>+<\/sup> Ion Irradation,&#8221;\u00a0The 6th\u00a0Waseda-NIMS International Symposium, Waseda University, Jul. 29, 2015.<\/li>\n<li><span style=\"color: #0000ff;\"><span style=\"color: #000000;\"><span style=\"text-decoration: underline;\">Taiyu Xu<\/span>, Shuichiro Hashimoto, Kohei Takei, Jing Sun, Xu Zhang, Shuhei Asada,\u00a0<\/span><\/span>Takashi Matsukawa, Meishoku Masahara\u00a0and Takanobu Watanabe, &#8220;Demonstration of Nanowire Schottky Barrier Tunnel FET,&#8221;\u00a0The 6th\u00a0Waseda-NIMS International Symposium, Waseda University, Jul. 29, 2015.<\/li>\n<li><span style=\"color: #0000ff;\"><span style=\"color: #000000;\"><span style=\"text-decoration: underline;\">Kenta Imazu<\/span>, Shuichiro Hashimoto, Genki Obana, Takefumi Kamioka, Takanobu Watanabe<\/span><\/span>, &#8220;Morphology Changes of Ni Ion Irradiated Si(111) Surface at Room Temperature,&#8221;\u00a0The 6th\u00a0Waseda-NIMS International Symposium, Waseda University, Jul. 29, 2015.<\/li>\n<\/ol>\n<p><!--nextpage--><\/p>\n<ol>\n<li><span style=\"text-decoration: underline;\">Akito Suzuki<\/span>, Takefumi Kamioka, Yoshinari Kamakura, Kenji Ohmori,\u3000Keisaku Yamada, and Takanobu Watanabe, &#8220;Source-induced RDF Overwhelms RTN in Nanowire Transistor:\u00a0Statistical Analysis with Full Device EMC\/MD Simulation,&#8221;\u00a0IEEE International Electron Devices Meeting (IEDM 2014),\u00a0Hilton San Francisco Union Square,\u00a0San Francisco, USA, Dec. 14, 2014.<\/li>\n<li><span style=\"text-decoration: underline;\">Suichiro Hashimoto<\/span>, Hiroki Kosugiyama, Kohei Takei, Jing Sun R. Imai, H. Tokutake, Motohiro Tomita, Atsushi Ogura, Takashi Matsukawa Meishoku Masahara and Takanobu Watanabe, &#8220;Impact of post-oxidation annealing of Si nanowire on its Ni silicidation rate,&#8221;\u00a027th International Microprocesses and Nanotechnology Conference (MNC 2014),\u00a0Hilton Fukuoak Sea Hawk, Fukuoka, Japan, Nov. 6, 2014.<\/li>\n<li>(Invited)<span style=\"text-decoration: underline;\"> Takanobu Watanabe<\/span>, Ryo Kuriyama, Masahiro Hashiguchi, Ryusuke Takahashi, Kosuke Shimura, Atsushi Ogura, and Sinich Satoh, &#8220;Molecular Dynamics Simulation of Dipole Layer Formation at High-k\/SiO<sub>2<\/sub> Interface,&#8221;\u00a0226th Meeting of The Electrochemical Society,\u00a0Moon Palace Resort, Cancun, Mexico Oct. 6, 2014.<\/li>\n<li><span style=\"text-decoration: underline;\">Tomofumi Zushi<\/span>, Kenji Ohmori, Keisaku Yamada, and Takanobu Watanabe, &#8221;\u00a0Thermal Transport Properties of Si Nanowire Covered with SiO<sub>2<\/sub> Layer: A Molecular Dynamics Study,&#8221;\u00a02014 International Conference on Solid State Devices and Materials (SSDM 2014), Epocal Tsukuba, Tsukuba, Japan, Sep. 10, 2014.<\/li>\n<li><span style=\"text-decoration: underline;\">Akito Suzuki<\/span>, Takefumi Kamioka, Yoshinari Kamakura, and Takanobu Watanabe, &#8220;Full-Scale Whole Device EMC\/MD Simulation of Si Nanowire Transistor Including Source and Drain Regions by Utilizing Graphic Processing Units,&#8221;\u00a02014\u3000International Conference on Simulation of Semiconductor Processes and Devices (SISPAD 2014),&#8221;\u00a0Mielparque Yokohama, Yokohama, Japan, Sep. 11, 2014.<\/li>\n<li>(Requested) <span style=\"text-decoration: underline;\">Takanobu Watanabe<\/span>, &#8220;Molecular dynamics simulation of gate dielectric thin films,&#8221;\u00a0The 5th NIMS\/MANA-Waseda University International Symposium,\u00a0NIMS Sengen site, Tsukuba, Japan, Mar. 24, 2014.<\/li>\n<li><span style=\"text-decoration: underline;\">Tomofumi Zushi<\/span>, &#8220;A Simulation Study of Thermoelectric Properties of Silicon Nanotubes,&#8221;\u00a0The 5th NIMS\/MANA-Waseda University International Symposium,\u00a0NIMS Sengen site, Tsukuba, Japan, Mar. 24, 2014.<\/li>\n<li><span style=\"text-decoration: underline;\">Ryo Kuriyama<\/span>, Masahiro Hashiguchi, Ryusuke Takahashi, Atsushi Ogura, Shinichi Satoh, Takanobu Watanabe, &#8220;Molecular Dynamics Study on the Formation of Dipole Layer at High-k\/SiO<sub>2<\/sub> Interfaces,&#8221;\u00a02013 International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES &#8211; SCIENCE AND TECHNOLOGY -,\u00a0University of Tsukuba (Tokyo Campus), Tokyo, Japan, Nov. 7, 2013.<\/li>\n<li><span style=\"text-decoration: underline;\">Hiroki Yamashita<\/span>, Hiroki Kosugiyama, Yasuhiro Shikahama, Shuichiro Hashimoto, Kouhei Takei , Jing Sun, Takashi Matsukawa, Meishoku Masahara, and Takanobu Watanabe, &#8221;\u00a026th International Microprocesses and Nanotechnology Conference (MNC 2013), \u00a0Royton Sapporo, Sapporo, Japan, Nov. 7, 2013.<\/li>\n<li><span style=\"text-decoration: underline;\">Kotaro Mura<\/span>, Takefumi Kamioka, Tetsu Kitani, Kenta Imazu, and Takanobu Watanabe, &#8220;Real-time Scanning Tunneling Microscopy Observation of Ni Ion Irradiation Process on Si(111) Surfaces,&#8221;\u00a012th International Conference on Atomically Controlled Surfaces, Interfaces and Nanostructures (ACSIN-12),\u00a0Tsukuba International Congress Center, Tsukuba, Japan, Nov. 5, 2013.<\/li>\n<\/ol>\n<p><!--nextpage--><\/p>\n<ol>\n<li><span style=\"text-decoration: underline;\">Masahiro Hashiguchi<\/span>, Ryo Kuriyama, Ryusuke Takahashi, Atsushi Ogura, Shinichi Satoh and Takanobu Watanabe, &#8220;Electrostatic Force Originated From the Dipole Layer at Al<sub>2<\/sub>O<sub>3<\/sub>\/SiO<sub>2<\/sub> Interface,&#8221;\u00a02013 NIMS CONFERENCE,\u00a0EPOCHAL TSUKUBA, Tsukuba, Japan, Jul. 2, 2013.<\/li>\n<li><span style=\"text-decoration: underline;\">Ryo Kuriyama<\/span>, Masahiro Hashiguchi, Ryusuke Takahashi, Atsushi Ogura, Shinichi Satoh and Takanobu Watanabe, &#8220;Molecular Dynamics Study on Dipole Layer Formation at Al<sub>2<\/sub>O<sub>3<\/sub>\/SiO<sub>2<\/sub> Interface,&#8221;\u00a02013 NIMS CONFERENCE,\u00a0EPOCHAL TSUKUBA, Tsukuba, Japan, Jul. 2, 2013.<\/li>\n<li>(Invited)\u00a0<span style=\"text-decoration: underline;\">Takanobu Watanabe<\/span>, &#8220;Recent Progress in Molecular Dynamics Simulation of Semiconductor Interfaces,&#8221;\u00a02013 NIMS CONFERENCE,\u00a0EPOCHAL TSUKUBA, Tsukuba, Japan, Jul. 3, 2013.<\/li>\n<li><span style=\"text-decoration: underline;\">Hiroya Imai<\/span>, Takefumi Kamioka, Yoshinari Kamakura, Kenji Ohmori, Kenji Shiraishi, Masaaki Niwa, Keisaku Yamada and Takanobu Watanabe, &#8220;Effect of Interface Roughness on Carrier Transport in Asymmetric Channel: An EMC\/MD Simulation Study,&#8221;\u00a016th International Workshop on Computational Electronics,\u00a0Nara Prefectural New Public Hall, Nara, Japan, Jun. 5, 2013.<\/li>\n<li><span style=\"text-decoration: underline;\">Akito Suzuki<\/span>, Takefumi Kamioka, Hiroya Imai, Yoshinari Kamakura , and Takanobu Watanabe , &#8220;Accelerated parallel computing of carrier transport simulation utilizing graphic processing units,&#8221;\u00a016th International Workshop on Computational Electronics,\u00a0Nara Prefectural New Public Hall, Nara, Japan, Jun. 5, 2013.<\/li>\n<li><span style=\"text-decoration: underline;\">Takefumi Kamioka<\/span>, Hiroya Imai, Yoshinari Kamakura, Kenji Ohmori, Kenji Shiraishi, Masanori Niwa, Keisaku Yamada, Takanobu Watanabe, &#8220;Current fluctuation in sub-nano second regime in gate-all-around nanowire channels studied with ensemble Monte Carlo\/molecular dynamics simulation,&#8221;\u00a0IEEE International Electron Devices Meeting (IEDM 2012),&#8221;\u00a0Hilton San Francisco Union Square,\u00a0San Francisco, USA, Dec. 11, 2012.<\/li>\n<li><span style=\"text-decoration: underline;\">Fumiya Isono<\/span>, Takefumi Kamioka, Yuji Kawamura, Yasuhiro Shikahama, Hiroki Yamashita, Kohei Yamada, Kotaro Mura, Takanobu Watanabe, &#8220;In-Situ Scanning Tunneling Microscopy of Ion Irradiation Process on Wire-patterned Si Surface,&#8221;\u00a034th International Symposium on Dry Process (DPS 2012), Tokyo University, Tokyo, Japan, Nov. 15, 2012.<\/li>\n<li>(Invited) <span style=\"text-decoration: underline;\">Takanobu Watanabe<\/span>, Tomofumi Zushi, Masanori Tomita, &#8220;Molecular Dynamics Simulation of Thermal Properties of Nano-scale Silicon Structures Covered with Oxide Film,&#8221;\u00a0The 3rd Advanced Materials Development and Integration of Novel Structured Metallic and Inorganic Materials (AMDI-3),&#8221;\u00a0Loisir Hotel Toyohashi, Toyohashi, Japan, Nov. 7, 2012.<\/li>\n<li><span style=\"text-decoration: underline;\">Takanobu Watanabe<\/span>, Tomofumi Zushi, Masanori Tomita, Ryo Kuriyama, Naoshige Aoki, Takefumi Kamioka, &#8220;Phonon Dispersion in &lt;100&gt; Si Nanowire Covered with SiO<sub>2<\/sub> Film Calculated by Molecular Dynamics Simulation,&#8221;\u00a0PRiME 2012, ECS 222nd Meeting, SiGe, Ge, and Related Compounds: Materials, Processing, and Devices 5,\u00a0Hawaii Convention Center,\u00a0Honolulu, USA, Oct. 10, 2012.<\/li>\n<li><span style=\"text-decoration: underline;\">Tomofumi Zushi<\/span>, Takanobu Watanabe, Kenji Ohmori, Keisaku Yamada, &#8220;Molecular Dynamics Simulation of Heat Transport in Silicon Fin Structures,&#8221;\u00a02012\u3000International Conference on Simulation of Semiconductor Processes and Devices (SISPAD2012),\u00a0Sheraton Denver Downtown Hotel,\u00a0Denver, USA, Sep. 5, 2012.<\/li>\n<\/ol>\n<p><!--nextpage--><\/p>\n<ol>\n<li><span style=\"text-decoration: underline;\">Takefumi Kamioka<\/span>, Hiroya Imai, Yoshinari Kamakura, Kenji Ohmori, Kenji Shiraishi, Masanori Niwa, Keisaku Yamada, Takanobu Watanabe,\u00a02012\u3000International Conference on Simulation of Semiconductor Processes and Devices (SISPAD2012),\u00a0Sheraton Denver Downtown Hotel,\u00a0Denver, USA, Sep. 5, 2012.<\/li>\n<li><span style=\"text-decoration: underline;\">Takefumi Kamioka<\/span>, Hiroya Imai, Takanobu Watanabe, Kenji Ohmori, Kenji Shiraishi, Yoshinari Kamakura, &#8220;Impact of Channel Shape on Carrier Transport Investigated by Ensemble Monte Carlo\/Molecular Dynamics Simulation,&#8221;\u00a02011 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD2011), Hotel Hankyu EXPO Park, Osaka, Japan, Sep. 8, 2011.<\/li>\n<li><span style=\"text-decoration: underline;\">Fumiya Isono<\/span>, Takefumi Kamioka, Iwao Ohdomari, Takanobu Watanabe, &#8220;In-Situ Scanning Tunneling Microscopy of Ion Irradiation Process on Hydrogen-Terminated Si(001)-2\u00d71 Surface,&#8221;\u00a0International Conference on the Formation of Semiconductor Interface (13th ICFSI),\u00a0Institute of Physics of the Academy of Sciences of the Czech Republic,\u00a0Prague,\u00a0Czech Republic, Jul. 5, 2011.<\/li>\n<li><span style=\"text-decoration: underline;\">Takefumi Kamioka<\/span>, Fumiya Isono, Takahiro Yoshida, Iwao Ohdomari, Takanobu Watanabe, &#8220;Challenge for STM Observation of Dopant Activation Process on Si(001): In-Situ Ion Irradiation and Hydrogenation,&#8221;\u00a0\u00a0International Conference on the Formation of Semiconductor Interface (13th ICFSI),\u00a0Institute of Physics of the Academy of Sciences of the Czech Republic,\u00a0Prague,\u00a0Czech Republic, Jul. 5, 2011.<\/li>\n<li>(Invited) <span style=\"text-decoration: underline;\">Takanobu Watanabe<\/span>, &#8220;Force Field Approaches for Modeling Oxide-Semiconductor Interfaces,&#8221;\u00a03rd Asian Consortium on Computational Material Science (ACCMS) Working Group Meeting,\u00a0Seogwipo KAL Hotel, Jeju Island,\u00a0Republic of Korea, Apr. 2, 2011.<\/li>\n<li><span style=\"text-decoration: underline;\">Takanobu Watanabe<\/span>, Tomoya Onda, and Iwao Ohdomari, &#8220;Misfit Stress Relaxation Mechanism in GeO<sub>2<\/sub>\/Ge Systems: A Classical Molecular Simulation Study,&#8221;\u00a0ECS 218th meeting,\u00a0Riviera Hotel, Las Vegas, USA, Oct. 14, 2010.<\/li>\n<li><span style=\"text-decoration: underline;\">Tomofumi Zushi<\/span>, Iwao Ohdomari, Takanobu Watanabe, Yoshinari Kamakura, Kenji Taniguchi, &#8220;Molecular Dynamics Simulation of LO Phonon Mode Decay in Si Nano-Structures Covered with Oxide Films,&#8221;\u00a0The International Conference on Simulation of Semiconductor Processes and Devices (SISPAD2010),\u00a0Royal Hotel Carlton,\u00a0Bologna, Italy, Sep. 6, 2010.<\/li>\n<li>Takanobu Watanabe, <span style=\"text-decoration: underline;\">Tomofumi Zushi<\/span>, Yoshinari Kamakura, Kenji Taniguchi, and Iwao Ohdomari, &#8220;Molecular Dynamics Simulation on Phonon Dynamics and Heat Transport in Nanoscale Silicon,&#8221;\u00a0International Symposium on Technology Evolution for Silicon Nano-Electronics (ISTESNE), Tokyo Institute of Technology, Tokyo, Japan, Jun. 3, 2010.<\/li>\n<li><span style=\"text-decoration: underline;\">Ryo Tosaka<\/span>, Hideaki Yamamoto, Iwao Ohdomari, and Takanobu Watanabe, &#8220;Molecular Dynamics Simulation on Adsorption of Ribosomal Protein L2 onto Silica Surface,&#8221; 2009 MRS Fall Meeting,\u00a0Boston, USA, Dec. 2009.<\/li>\n<li><span style=\"text-decoration: underline;\">Tomoya Onda<\/span>, Hideaki Yamamoto, Ryo Tosaka, and Takanobu Watanabe, &#8220;Large-Scale Modeling of GeO<sub>2<\/sub>\/Ge and SiO<sub>2<\/sub>\/Si Interface Structures,&#8221;\u00a02009 MRS Fall Meeting,\u00a0Boston, USA, Dec. 2009.<\/li>\n<\/ol>\n<p><!--nextpage--><\/p>\n<ol>\n<li><span style=\"text-decoration: underline;\">Tomofumi Zushi<\/span>, Takanobu Watanabe, Iwao Ohdomari, Yoshinari Kamakura, and Kenji Taniguchi, &#8220;Simulation on the Heat Transport in a Silicon Nano-structure Covered with Oxide Films,&#8221;\u00a02009 International Conference on Solid State Devices and Materials (SSDM 2009), Sendai Kokusai Hotel, Sendai, Japan, Oct. 2009.<\/li>\n<li><span style=\"text-decoration: underline;\">Tomoya Onda<\/span>, Hideaki Yamamoto, Ryo Tosaka, Iwao Ohdomari, and Takanobu Watanabe, &#8220;Atomistic Modeling of GeO2\/Ge and SiO2\/Si Interface Structures,&#8221;\u00a02009 International Conference on Solid State Devices and Materials (SSDM 2009), Sendai Kokusai Hotel, Sendai, Japan, Oct. 2009.<\/li>\n<li><span style=\"text-decoration: underline;\">Ikushin Tsuchida<\/span>, Aya Seike, Hajime Takai, J. Masuda, Daisuke Kosemura, Atsushi Ogura, Iwao Ohdomari and Takanobu Watanabe, &#8220;Experimental investigation of electron-phonon scattering effect in strained Si nanowire FETs at low temperature,&#8221;\u00a02009 International Conference on Solid State Devices and Materials (SSDM 2009), Sendai Kokusai Hotel, Sendai, Japan, Oct. 2009.<\/li>\n<li><span style=\"text-decoration: underline;\">Aya Seike<\/span>, Hajime Takai, Ikushin Tsuchida, J. Masuda, Daisuke Kosemura, Atsushi Ogura, Iwao Ohdomari and Takanobu Watanabe, &#8220;Impact of adequate selection of channel direction on (001) and (110) wafer orientation for strained nanowire transistors,&#8221; \u00a02009 International Conference on Solid State Devices and Materials (SSDM 2009), Sendai Kokusai Hotel, Sendai, Japan, Oct. 2009.<\/li>\n<li><span style=\"text-decoration: underline;\">Ikushin Tsuchida<\/span>, Aya Seike, Hajime Takai, J. Masuda, Daisuke Kosemura, Atsushi Ogura, Iwao Ohdomari and Takanobu Watanabe, &#8220;Electron-phonon scattering effect on strained Si nanowire FETs at low temperature,&#8221; 216th ECS Meeting,\u00a0Vienna,\u00a0Austria, Oct. 2009.<\/li>\n<li><span style=\"text-decoration: underline;\">Aya Seike<\/span>, Hajime Takai, Ikushin Tsuchida, J. Masuda, Daisuke Kosemura, Atsushi Ogura, Iwao Ohdomari, Takanobu Watanabe, &#8220;Demonstration of transconductance enhancement on (110) and (100) strained-nanowire FETs,&#8221;\u00a0216th ECS Meeting,\u00a0Vienna,\u00a0Austria, Oct. 2009.<\/li>\n<li><span style=\"text-decoration: underline;\">Takefumi Kamioka<\/span>, Yutaka Kazama, Takahiro Yoshida, Iwao Ohdomari, \u00a0Takanobu Watanabe, &#8220;Real-time scanning tunneling microscope observation of implanted gold atoms on silicon surface,&#8221;\u00a010th International Conference on Atomically Controlled Surfaces, Interfaces and Nanostructures (ACSIN-10),\u00a0Granada, Spain, Sep. 2009.<\/li>\n<li>(Invited)<span style=\"text-decoration: underline;\"> Takanobu Watanabe<\/span>, &#8220;Atomistic Picture of Silicon Oxidation Process; Beyond the Deal-Grove Model,&#8221;\u00a0International Conference on Computational &amp; Experimental Engineering and Sciences (ICCES&#8217;09),\u00a0HiltonPhuket Arcadia Resort &amp; Spa,\u00a0Phuket,\u00a0Thailand, Apr. 10, 2009.<\/li>\n<\/ol>\n","protected":false},"excerpt":{"rendered":"<p>(Invited, plenary) Takanobu Watanabe, Motohiro Tomita, Tianzhuo Zhan, Hui Zhang, Takashi Matsukawa, Takeo Matsuki, Yoshinari Kamakuri, and Hiroya Ikeda, \u201cCMOS Friendly Silicon-based Micro Thermoelectric Generator,\u201d\u00a05th International Conference on Nanoscience and Nanotechnology (ICONN2019),\u00a0 SRM Institute of Science and Technology, Kattankulathur,\u00a0\u00a0Chennai, India, January 30, 2019. Gakuki Ise,\u00a0\u00a0Daiki Yoda, Chinami Takiguchi, Naoya Shigematsu, Tomohiro Shiratori, Hisami Nakano, Woojae Jeon, Taichi Nozawa, Kei Iwashiro, Takumi Nishino, Toshitatsu Munakata and Takanobu Watanabe, \u201cControlling The Aerial Posture of a Flapping-wing Micro Air Vehicle by Shifting Its Center of Gravity,\u201d\u00a0The International Micro Air Vehicle Conference and Competition (IMAV), RMIT Melbourne, November, 23 (2018). Mao Xu,\u00a0Tianzhuo Zhan, Ryo Yamato, Hiroki Takezawa, Kohei Mesaki, Motohiro Tomita, Yibin Xu, and &hellip; <a href=\"https:\/\/www.watanabe-lab.jp\/en\/presentations.html\" class=\"more-link\">Continue reading <span class=\"screen-reader-text\">Presentations<\/span> <span class=\"meta-nav\">&rarr;<\/span><\/a><\/p>\n","protected":false},"author":1001002,"featured_media":44,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"_monsterinsights_skip_tracking":false,"_monsterinsights_sitenote_active":false,"_monsterinsights_sitenote_note":"","_monsterinsights_sitenote_category":0,"footnotes":""},"class_list":["post-41","page","type-page","status-publish","has-post-thumbnail","hentry"],"aioseo_notices":[],"_links":{"self":[{"href":"https:\/\/www.watanabe-lab.jp\/en\/wp-json\/wp\/v2\/pages\/41","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.watanabe-lab.jp\/en\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/www.watanabe-lab.jp\/en\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/www.watanabe-lab.jp\/en\/wp-json\/wp\/v2\/users\/1001002"}],"replies":[{"embeddable":true,"href":"https:\/\/www.watanabe-lab.jp\/en\/wp-json\/wp\/v2\/comments?post=41"}],"version-history":[{"count":14,"href":"https:\/\/www.watanabe-lab.jp\/en\/wp-json\/wp\/v2\/pages\/41\/revisions"}],"predecessor-version":[{"id":276,"href":"https:\/\/www.watanabe-lab.jp\/en\/wp-json\/wp\/v2\/pages\/41\/revisions\/276"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.watanabe-lab.jp\/en\/wp-json\/wp\/v2\/media\/44"}],"wp:attachment":[{"href":"https:\/\/www.watanabe-lab.jp\/en\/wp-json\/wp\/v2\/media?parent=41"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}